US Patent Issued to D2S on July 21 for "Method and system for determining a charged particle beam exposure for a local pattern density" (California Inventors)

ALEXANDRIA, Va., July 21 -- United States Patent no. 12,688,998, issued on July 21, was assigned to D2S Inc. (San Jose, Calif.).

"Method and system for determining a charged particle beam exposure for a local pattern density" was invented by Akira Fujimura (Saratoga, Calif.), Harold Robert Zable (Palo Alto, Calif.), Nagesh Shirali (San Jose, Calif.), Abhishek Shendre (Fremont, Calif.), William E. Guthrie (Santa Clara, Calif.) and Ryan Pearman (San Jose, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Methods for exposing a desired shape in an area on a surface using a charged particle beam system include determining a local pattern density for the area, based on an original set of exposure information....