ALEXANDRIA, Va., Sept. 8 -- United States Patent no. 12,731,755, issued on Sept. 8, was assigned to Hitachi High-Tech Science Corp. (Tokyo). "Focused ion beam device" was invented by Koji Nagahara (T... और पढ़ें
ALEXANDRIA, Va., Sept. 8 -- United States Patent no. 12,731,756, issued on Sept. 8, was assigned to FORSCHUNGSZENTRUM JULICH GMBH (Julich, Germany). "Magnetization device for an electron microscope a... और पढ़ें
ALEXANDRIA, Va., Sept. 8 -- United States Patent no. 12,731,757, issued on Sept. 8, was assigned to Carl Zeiss Microscopy GmbH (Jena, Germany). "Device and method for preparing microscopic samples vi... और पढ़ें
ALEXANDRIA, Va., Sept. 8 -- United States Patent no. 12,731,758, issued on Sept. 8, was assigned to JIANGSU LEUVEN INSTRUMENTS Co. LTD. (Xuzhou, China). "Ion beam etching machine and lower electrode ... और पढ़ें
ALEXANDRIA, Va., Sept. 8 -- United States Patent no. 12,731,759, issued on Sept. 8, was assigned to NuFlare Technology Inc. (Yokohama, Japan). "Beam detector, multi-charged-particle-beam irradiation ... और पढ़ें
ALEXANDRIA, Va., Sept. 8 -- United States Patent no. 12,731,760, issued on Sept. 8, was assigned to HITACHI HIGH-TECH Corp. (Tokyo). "Spin-polarized scanning electron microscope" was invented by Teru... और पढ़ें
ALEXANDRIA, Va., Sept. 8 -- United States Patent no. 12,731,762, issued on Sept. 8, was assigned to Tokyo Electron Ltd. (Tokyo). "Method for plasma processing" was invented by Justin Moses (Austin, T... और पढ़ें
ALEXANDRIA, Va., Sept. 8 -- United States Patent no. 12,731,763, issued on Sept. 8, was assigned to Tokyo Electron Ltd. (Tokyo). "Plasma processing system, assistance device, assistance method, and a... और पढ़ें
ALEXANDRIA, Va., Sept. 8 -- United States Patent no. 12,731,764, issued on Sept. 8, was assigned to Tokyo Electron Ltd. (Tokyo). "Substrate processing method and plasma processing apparatus" was inve... और पढ़ें
ALEXANDRIA, Va., Sept. 8 -- United States Patent no. 12,731,765, issued on Sept. 8, was assigned to Tokyo Electron Ltd. (Tokyo). "Substrate processing method and substrate processing apparatus" was i... और पढ़ें