US Patent Issued to Tokyo Electron on Sept. 8 for "Plasma processing system, assistance device, assistance method, and assistance program" (Japanese Inventors)

ALEXANDRIA, Va., Sept. 8 -- United States Patent no. 12,731,763, issued on Sept. 8, was assigned to Tokyo Electron Ltd. (Tokyo).

"Plasma processing system, assistance device, assistance method, and assistance program" was invented by Takayuki Katsunuma (Miyagi, Japan), Masanobu Honda (Miyagi, Japan) and Tetsuya Nishizuka (Miyagi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "The plasma processing system includes a plasma processing device, an assistance device, and a control device, in which the assistance device includes a first determination unit for determining, using a first machine learning model, a plurality of control parameters for processing a pre-processing substrate so that a predicted shap...