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US Patent Issued to SAMSUNG ELECTRONICS on Oct. 27 for "Optical proximity correction method using neural Jacobian matrix and method of manufacturing mask by using the optical proximity correction method" (South Korean Inventors)

ALEXANDRIA, Va., Oct. 27 -- United States Patent no. 12,775,207, issued on Oct. 27, was assigned to SAMSUNG ELECTRONICS Co. Ltd. (Suwon-si, South Korea). "Optical proximity correction method using ne... Read More


US Patent Issued to TAIWAN SEMICONDUCTOR MANUFACTURING on Oct. 27 for "Pellicle assembly and method of making same" (Taiwanese Inventors)

ALEXANDRIA, Va., Oct. 27 -- United States Patent no. 12,775,208, issued on Oct. 27, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan). "Pellicle assembly and method of... Read More


US Patent Issued to Inpria on Oct. 27 for "Stability-enhanced organotin photoresist compositions" (Oregon Inventors)

ALEXANDRIA, Va., Oct. 27 -- United States Patent no. 12,775,209, issued on Oct. 27, was assigned to Inpria Corp. (Corvallis, Ore.). "Stability-enhanced organotin photoresist compositions" was invente... Read More


US Patent Issued to Meta Platforms Technologies on Oct. 27 for "Gray-tone resists and processes" (Washington Inventors)

ALEXANDRIA, Va., Oct. 27 -- United States Patent no. 12,775,210, issued on Oct. 27, was assigned to Meta Platforms Technologies LLC (Menlo Park, Calif.). "Gray-tone resists and processes" was invente... Read More


US Patent Issued to SHIN-ETSU CHEMICAL on Oct. 27 for "Positive resist material and patterning process" (Japanese Inventor)

ALEXANDRIA, Va., Oct. 27 -- United States Patent no. 12,775,211, issued on Oct. 27, was assigned to SHIN-ETSU CHEMICAL Co. LTD. (Tokyo). "Positive resist material and patterning process" was invented... Read More


US Patent Issued to Samsung SDI on Oct. 27 for "Hardmask composition, hardmask layer, and method of forming patterns" (South Korean Inventors)

ALEXANDRIA, Va., Oct. 27 -- United States Patent no. 12,775,212, issued on Oct. 27, was assigned to Samsung SDI Co. Ltd. (Yongin-si, South Korea). "Hardmask composition, hardmask layer, and method of... Read More


US Patent Issued to TAIWAN SEMICONDUCTOR MANUFACTURING on Oct. 27 for "Materials and methods for forming resist bottom layer" (Taiwanese Inventors)

ALEXANDRIA, Va., Oct. 27 -- United States Patent no. 12,775,213, issued on Oct. 27, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING Co. LTD. (Hsinchu, Taiwan). "Materials and methods for forming r... Read More


US Patent Issued to SAMSUNG ELECTRONICS on Oct. 27 for "Method of forming photoresist patterns and baking equipment" (South Korean Inventors)

ALEXANDRIA, Va., Oct. 27 -- United States Patent no. 12,775,214, issued on Oct. 27, was assigned to SAMSUNG ELECTRONICS Co. Ltd. (Suwon-si, South Korea). "Method of forming photoresist patterns and b... Read More


US Patent Issued to Carl Zeiss SMT on Oct. 27 for "Method for measuring an illumination angle distribution on an object field and illumination optics unit having an illumination channel allocation intended therefor" (German Inventors)

ALEXANDRIA, Va., Oct. 27 -- United States Patent no. 12,775,215, issued on Oct. 27, was assigned to Carl Zeiss SMT GmbH (Oberkochen, Germany). "Method for measuring an illumination angle distribution... Read More


US Patent Issued to SAMSUNG ELECTRONICS on Oct. 27 for "Semiconductor process apparatus" (South Korean Inventors)

ALEXANDRIA, Va., Oct. 27 -- United States Patent no. 12,775,216, issued on Oct. 27, was assigned to SAMSUNG ELECTRONICS Co. LTD. (Suwon-si, South Korea). "Semiconductor process apparatus" was invente... Read More