US Patent Issued to SAMSUNG ELECTRONICS on Oct. 27 for "Optical proximity correction method using neural Jacobian matrix and method of manufacturing mask by using the optical proximity correction method" (South Korean Inventors)

ALEXANDRIA, Va., Oct. 27 -- United States Patent no. 12,775,207, issued on Oct. 27, was assigned to SAMSUNG ELECTRONICS Co. Ltd. (Suwon-si, South Korea).

"Optical proximity correction method using neural Jacobian matrix and method of manufacturing mask by using the optical proximity correction method" was invented by Moojoon Shin (Suwon-si, South Korea) and Sooyong Lee (Suwon-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "An optical proximity correction (OPC) method using a Jacobian matrix, which may minimize an edge placement error (EPE) of an arbitrary pattern, and a method of manufacturing a mask by using the OPC method. The OPC method may include obtaining training data for calculating a ...