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US Patent Issued to CENTRAL GLASS on May 12 for "Method for removing molybdenum monofluoride to molybdenum pentafluoride and method for producing semiconductor device" (Japanese Inventors)

ALEXANDRIA, Va., May 12 -- United States Patent no. 12,624,445, issued on May 12, was assigned to CENTRAL GLASS Co. LTD. (Ube, Japan). "Method for removing molybdenum monofluoride to molybdenum penta... Read More


US Patent Issued to Applied Materials on May 12 for "Pumping liners with self-adjusting pumping conductance" (California Inventors)

ALEXANDRIA, Va., May 12 -- United States Patent no. 12,624,446, issued on May 12, was assigned to Applied Materials Inc. (Santa Clara, Calif.). "Pumping liners with self-adjusting pumping conductance... Read More


US Patent Issued to TAIWAN SEMICONDUCTOR MANUFACTURING on May 12 for "Semiconductor process chamber with improved reflector" (Taiwanese Inventors)

ALEXANDRIA, Va., May 12 -- United States Patent no. 12,624,447, issued on May 12, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan). "Semiconductor process chamber wit... Read More


US Patent Issued to ASM IP Holding on May 12 for "Systems, devices, and methods for forming layers comprising a group 14 element, a pnictogen, and a chalcogen" (Belgian, Finnish, German Inventors)

ALEXANDRIA, Va., May 12 -- United States Patent no. 12,624,448, issued on May 12, was assigned to ASM IP Holding B.V. (Amsterdam). "Systems, devices, and methods for forming layers comprising a group... Read More


US Patent Issued to LOTUS APPLIED TECHNOLOGY on May 12 for "Methods and systems for inhibiting precursor interactions during radical-enhanced atomic layer deposition" (Oregon Inventor)

ALEXANDRIA, Va., May 12 -- United States Patent no. 12,624,449, issued on May 12, was assigned to LOTUS APPLIED TECHNOLOGY LLC (Hillsboro, Ore.). "Methods and systems for inhibiting precursor interac... Read More


US Patent Issued to ASM IP Holding on May 12 for "Methods for forming and utilizing antimony containing films, and related structures" (Belgian, British, Japanese, Finnish Inventors)

ALEXANDRIA, Va., May 12 -- United States Patent no. 12,624,450, issued on May 12, was assigned to ASM IP Holding B.V. (Almere, Netherlands). "Methods for forming and utilizing antimony containing fil... Read More


US Patent Issued to HERVANNAN SAUNA on May 12 for "Atomic layer deposition apparatus" (Finnish Inventors)

ALEXANDRIA, Va., May 12 -- United States Patent no. 12,624,451, issued on May 12, was assigned to HERVANNAN SAUNA OY (Espoo, Finland). "Atomic layer deposition apparatus" was invented by Hulda Aminof... Read More


US Patent Issued to ASM IP Holding on May 12 for "Systems and methods of controlling gas flows in semiconductor processing systems" (Arizona Inventors)

ALEXANDRIA, Va., May 12 -- United States Patent no. 12,624,452, issued on May 12, was assigned to ASM IP Holding B.V. (Almere, Netherlands). "Systems and methods of controlling gas flows in semicondu... Read More


US Patent Issued to Tokyo Electron on May 12 for "Substrate processing apparatus" (Japanese Inventors)

ALEXANDRIA, Va., May 12 -- United States Patent no. 12,624,453, issued on May 12, was assigned to Tokyo Electron Ltd. (Tokyo). "Substrate processing apparatus" was invented by Naoki Umehara (Nirasaki... Read More


US Patent Issued to Applied Materials on May 12 for "In situ failure detection in semiconductor processing chambers" (Indian Inventors)

ALEXANDRIA, Va., May 12 -- United States Patent no. 12,624,454, issued on May 12, was assigned to Applied Materials Inc. (Santa Clara, Calif.). "In situ failure detection in semiconductor processing ... Read More