US Patent Issued to Applied Materials on May 12 for "In situ failure detection in semiconductor processing chambers" (Indian Inventors)

ALEXANDRIA, Va., May 12 -- United States Patent no. 12,624,454, issued on May 12, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"In situ failure detection in semiconductor processing chambers" was invented by Srivatsa Madananth (Karnataka, India), Dhananjai Kumar (Karnataka, India), Yogananda Sarode Vishwanath (Bangalore, India) and Jacob Andrews (Bangalore, India).

According to the abstract* released by the U.S. Patent & Trademark Office: "Exemplary semiconductor processing chambers may include a chamber body defining a substrate processing region. The chambers may include a substrate support positioned within the substrate processing region. The substrate support may include a ceramic or polymeric insulator plate positio...