ALEXANDRIA, Va., May 12 -- United States Patent no. 12,624,452, issued on May 12, was assigned to ASM IP Holding B.V. (Almere, Netherlands).
"Systems and methods of controlling gas flows in semiconductor processing systems" was invented by Mark Fessler (Phoenix) and Glenn Holbrook (Scottsdale, Ariz.).
According to the abstract* released by the U.S. Patent & Trademark Office: "A gas system includes an enclosure, a process gas metering valve, a shutoff valve, and a flow switch. The process gas metering valve arranged within the enclosure to flow a process gas to a process chamber of a semiconductor processing system. The shutoff valve is connected to the process gas metering valve to fluidly separate the process gas metering valve from a pr...