ALEXANDRIA, Va., May 19 -- United States Patent no. 12,635,480, issued on May 19, was assigned to DENSO Corp. (Kariya-city, Japan), TOYOTA JIDOSHA K.K. (Toyota, Japan) and MIRISE Technologies Corp. (N... Read More
ALEXANDRIA, Va., May 19 -- United States Patent no. 12,635,481, issued on May 19, was assigned to DISCO Corp. (Tokyo). "Chuck table and manufacturing method of chuck table" was invented by Masaru Nak... Read More
ALEXANDRIA, Va., May 19 -- United States Patent no. 12,635,482, issued on May 19, was assigned to SAMSUNG ELECTRONICS Co. LTD. (Suwon-si, South Korea). "Method of forming a pattern of semiconductor d... Read More
ALEXANDRIA, Va., May 19 -- United States Patent no. 12,635,483, issued on May 19, was assigned to ASM IP Holding B.V. (Almere, Netherlands). "Method and system for forming material within a gap using... Read More
ALEXANDRIA, Va., May 19 -- United States Patent no. 12,635,485, issued on May 19, was assigned to Semiconductor Energy Laboratory Co. Ltd. (Japan). "Manufacturing method of semiconductor device" was ... Read More
ALEXANDRIA, Va., May 19 -- United States Patent no. 12,635,486, issued on May 19, was assigned to NEXCHIP SEMICONDUCTOR Corp. (Hefei, China). "Semiconductor device and manufacturing method thereof" w... Read More
ALEXANDRIA, Va., May 19 -- United States Patent no. 12,635,487, issued on May 19, was assigned to International Business Machines Corp. (Armonk, N.Y.). "Semiconductor backside isolation feature for m... Read More
ALEXANDRIA, Va., May 19 -- United States Patent no. 12,635,488, issued on May 19, was assigned to TEXAS INSTRUMENTS Inc. (Dallas). "Merged trenches surrounded by wider trench for isolating semiconduc... Read More
ALEXANDRIA, Va., May 19 -- United States Patent no. 12,635,489, issued on May 19, was assigned to DB HiTek Co. Ltd. (Bucheon-si, South Korea). "High voltage semiconductor device and method of manufac... Read More
ALEXANDRIA, Va., May 19 -- United States Patent no. 12,635,490, issued on May 19, was assigned to DB HiTek Co. Ltd. (Bucheon-si, South Korea). "Deep trench isolation including air gap and embossed po... Read More