US Patent Issued to Hitachi High-Tech on June 16 for "Ion milling apparatus" (Japanese Inventors)

ALEXANDRIA, Va., June 16 -- United States Patent no. 12,658,399, issued on June 16, was assigned to Hitachi High-Tech Corp. (Tokyo). "Ion milling apparatus" was invented by Shota Aida (Tokyo), Hisayu... Read More

US Patent Issued to NISSIN ION EQUIPMENT on June 16 for "Ion source" (New Hampshire, Massachusetts Inventors)

ALEXANDRIA, Va., June 16 -- United States Patent no. 12,658,400, issued on June 16, was assigned to NISSIN ION EQUIPMENT Co. LTD. (Koka-city, Japan). "Ion source" was invented by George Sacco (Grovel... Read More

US Patent Issued to ICT Integrated Circuit Testing Gesellschaft fur Halbleiterpruftechnik mbH on June 16 for "Proximity-electrode, charged particle beam device and method for inspecting and/or imaging a sample" (German Inventor)

ALEXANDRIA, Va., June 16 -- United States Patent no. 12,658,401, issued on June 16, was assigned to ICT Integrated Circuit Testing Gesellschaft fur Halbleiterpruftechnik mbH (Heimstetten, Germany). "... Read More

US Patent Issued to ICT Integrated Circuit Testing Gesellschaft fur Halbleiterpruftechnik mbH on June 16 for "Magnetic multipole device, charged particle beam apparatus, and method of influencing a charged particle beam propagating along an optical axis" (German Inventor)

ALEXANDRIA, Va., June 16 -- United States Patent no. 12,658,402, issued on June 16, was assigned to ICT Integrated Circuit Testing Gesellschaft fur Halbleiterpruftechnik mbH (Heimstetten, Germany). "... Read More

US Patent Issued to Applied Materials Israel on June 16 for "Electric field reduction mechanism" (Israeli Inventors)

ALEXANDRIA, Va., June 16 -- United States Patent no. 12,658,403, issued on June 16, was assigned to Applied Materials Israel Ltd. (Rehovot, Israel). "Electric field reduction mechanism" was invented ... Read More

US Patent Issued to SUMITOMO HEAVY INDUSTRIES ION TECHNOLOGY on June 16 for "Ion implanter and ion implantation method" (Japanese Inventor)

ALEXANDRIA, Va., June 16 -- United States Patent no. 12,658,404, issued on June 16, was assigned to SUMITOMO HEAVY INDUSTRIES ION TECHNOLOGY Co. LTD. (Tokyo). "Ion implanter and ion implantation meth... Read More

US Patent Issued to NuFlare Technology on June 16 for "Charged particle beam writing method and charged particle beam writing apparatus" (Japanese Inventors)

ALEXANDRIA, Va., June 16 -- United States Patent no. 12,658,405, issued on June 16, was assigned to NuFlare Technology Inc. (Yokohama, Japan). "Charged particle beam writing method and charged partic... Read More

US Patent Issued to Carl Zeiss Microscopy on June 16 for "Determining a position of an object in a beam apparatus" (German Inventor)

ALEXANDRIA, Va., June 16 -- United States Patent no. 12,658,406, issued on June 16, was assigned to Carl Zeiss Microscopy GmbH (Jena, Germany). "Determining a position of an object in a beam apparatu... Read More

US Patent Issued to Tokyo Electron on June 16 for "Plasma processing apparatus and plasma processing method" (Japanese Inventors)

ALEXANDRIA, Va., June 16 -- United States Patent no. 12,658,407, issued on June 16, was assigned to Tokyo Electron Ltd. (Tokyo). "Plasma processing apparatus and plasma processing method" was invente... Read More

US Patent Issued to Semes on June 16 for "Apparatus and method for treating substrate" (South Korean Inventors)

ALEXANDRIA, Va., June 16 -- United States Patent no. 12,658,408, issued on June 16, was assigned to Semes Co. LTD. (Cheonan-si, South Korea). "Apparatus and method for treating substrate" was invente... Read More

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