US Patent Issued to NuFlare Technology on June 16 for "Charged particle beam writing method and charged particle beam writing apparatus" (Japanese Inventors)

ALEXANDRIA, Va., June 16 -- United States Patent no. 12,658,405, issued on June 16, was assigned to NuFlare Technology Inc. (Yokohama, Japan).

"Charged particle beam writing method and charged particle beam writing apparatus" was invented by Haruyuki Nomura (Yokohama, Japan) and Takahito Nakayama (Yokohama, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "The purpose of the present invention is to correct a beam irradiation position shift caused by charging phenomena with high accuracy. A charged particle beam writing method includes virtually dividing a writing region of the substrate so as to have a predetermined mesh size and calculating a pattern density distribution representing an arrangement ratio...