US Patent Issued to Applied Materials Israel on June 16 for "Electric field reduction mechanism" (Israeli Inventors)

ALEXANDRIA, Va., June 16 -- United States Patent no. 12,658,403, issued on June 16, was assigned to Applied Materials Israel Ltd. (Rehovot, Israel).

"Electric field reduction mechanism" was invented by Adam Faust (Rehovot, Israel), Yosi Basson (Rehovot, Israel), Ittamar Levy (Rehovot, Israel) and Mor Battat (Rehovot, Israel).

According to the abstract* released by the U.S. Patent & Trademark Office: "An electrostatic chuck, that includes (a) an electrostatic chuck body having a top surface and being configured to support a sample; (b) a space formed within the electrostatic chuck body, the space has a top opening; (c) a sharp conductive element; (d) a masking electrode; and (e) a movement unit that is configured to position the masking el...