US Patent Issued to Tokyo Electron on June 16 for "Plasma processing apparatus and plasma processing method" (Japanese Inventors)

ALEXANDRIA, Va., June 16 -- United States Patent no. 12,658,407, issued on June 16, was assigned to Tokyo Electron Ltd. (Tokyo).

"Plasma processing apparatus and plasma processing method" was invented by Takahiro Takeuchi (Miyagi, Japan) and Ken Kobayashi (Miyagi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "An RF system includes: a first RF generator configured to generate a first RF pulsed signal including a plurality of first pulse cycles, each first pulse cycle including a first period, a second period, and a third period; a second RF generator configured to generate a second RF pulsed signal including a plurality of second pulse cycles, each second pulse cycle including a fourth period and a fif...