US Patent Issued to SEIKO EPSON on May 5 for "Illuminator and projector" (Japanese Inventors)

ALEXANDRIA, Va., May 5 -- United States Patent no. 12,619,138, issued on May 5, was assigned to SEIKO EPSON Corp. (Tokyo). "Illuminator and projector" was invented by Shigekazu Aoki (Matsumoto-Shi, J... Read More

US Patent Issued on May 5 for "Projector assembly" (California Inventor)

ALEXANDRIA, Va., May 5 -- United States Patent no. 12,619,139, issued on May 5. "Projector assembly" was invented by Titus Gadwin Watts (San Francisco). According to the abstract* released by the U.... Read More

US Patent Issued to SEIKO EPSON on May 5 for "Light source apparatus and projector" (Japanese Inventors)

ALEXANDRIA, Va., May 5 -- United States Patent no. 12,619,140, issued on May 5, was assigned to SEIKO EPSON Corp. (Tokyo). "Light source apparatus and projector" was invented by Wataru Yasumatsu (Azu... Read More

US Patent Issued to CUPOLA360 on May 5 for "Image projection method for virtual tour" (Taiwanese Inventor)

ALEXANDRIA, Va., May 5 -- United States Patent no. 12,619,141, issued on May 5, was assigned to CUPOLA360 INC. (Hsinchu City, Taiwan). "Image projection method for virtual tour" was invented by Chung... Read More

US Patent Issued to TAIWAN SEMICONDUCTOR MANUFACTURING on May 5 for "Methods of manufacturing pellicle for EUV lithography masks" (Taiwanese Inventors)

ALEXANDRIA, Va., May 5 -- United States Patent no. 12,619,142, issued on May 5, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan). "Methods of manufacturing pellicle f... Read More

US Patent Issued to Morphotonics Holding on May 5 for "Apparatus and process for replicating a texture" (Dutch Inventors)

ALEXANDRIA, Va., May 5 -- United States Patent no. 12,619,143, issued on May 5, was assigned to Morphotonics Holding B.V. (Veldhoven, Netherlands). "Apparatus and process for replicating a texture" w... Read More

US Patent Issued to DONGJIN SEMICHEM on May 5 for "Positive photosensitive resin composition" (South Korean Inventors)

ALEXANDRIA, Va., May 5 -- United States Patent no. 12,619,144, issued on May 5, was assigned to DONGJIN SEMICHEM Co. LTD. (Incheon, South Korea). "Positive photosensitive resin composition" was inven... Read More

US Patent Issued to Sumitomo Chemical on May 5 for "Carboxylate, carboxylic acid generator, resin, resist composition and method for producing resist pattern" (Japanese Inventors)

ALEXANDRIA, Va., May 5 -- United States Patent no. 12,619,145, issued on May 5, was assigned to Sumitomo Chemical Co. Ltd. (Tokyo). "Carboxylate, carboxylic acid generator, resin, resist composition ... Read More

US Patent Issued to FUJIFILM on May 5 for "Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for manufacturing electronic device" (Japanese Inventors)

ALEXANDRIA, Va., May 5 -- United States Patent no. 12,619,147, issued on May 5, was assigned to FUJIFILM Corp. (Tokyo). "Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-se... Read More

US Patent Issued to Taiwan Semiconductor Manufacturing on May 5 for "Crosslinkable photoresist for extreme ultraviolet lithography" (Taiwanese Inventors)

ALEXANDRIA, Va., May 5 -- United States Patent no. 12,619,148, issued on May 5, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan). "Crosslinkable photoresist for extreme u... Read More

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