ALEXANDRIA, Va., May 12 -- United States Patent no. 12,624,443, issued on May 12, was assigned to Eugenus Inc. (San Jose, Calif.). "Precursor delivery system and method for high speed cyclic depositi... Read More
ALEXANDRIA, Va., May 12 -- United States Patent no. 12,624,444, issued on May 12, was assigned to Tokyo Electron Ltd. (Tokyo). "Film forming method and film forming apparatus" was invented by Nobuo M... Read More
ALEXANDRIA, Va., May 12 -- United States Patent no. 12,624,445, issued on May 12, was assigned to CENTRAL GLASS Co. LTD. (Ube, Japan). "Method for removing molybdenum monofluoride to molybdenum penta... Read More
ALEXANDRIA, Va., May 12 -- United States Patent no. 12,624,446, issued on May 12, was assigned to Applied Materials Inc. (Santa Clara, Calif.). "Pumping liners with self-adjusting pumping conductance... Read More
ALEXANDRIA, Va., May 12 -- United States Patent no. 12,624,447, issued on May 12, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan). "Semiconductor process chamber wit... Read More
ALEXANDRIA, Va., May 12 -- United States Patent no. 12,624,448, issued on May 12, was assigned to ASM IP Holding B.V. (Amsterdam). "Systems, devices, and methods for forming layers comprising a group... Read More
ALEXANDRIA, Va., May 12 -- United States Patent no. 12,624,449, issued on May 12, was assigned to LOTUS APPLIED TECHNOLOGY LLC (Hillsboro, Ore.). "Methods and systems for inhibiting precursor interac... Read More
ALEXANDRIA, Va., May 12 -- United States Patent no. 12,624,450, issued on May 12, was assigned to ASM IP Holding B.V. (Almere, Netherlands). "Methods for forming and utilizing antimony containing fil... Read More
ALEXANDRIA, Va., May 12 -- United States Patent no. 12,624,451, issued on May 12, was assigned to HERVANNAN SAUNA OY (Espoo, Finland). "Atomic layer deposition apparatus" was invented by Hulda Aminof... Read More
ALEXANDRIA, Va., May 12 -- United States Patent no. 12,624,452, issued on May 12, was assigned to ASM IP Holding B.V. (Almere, Netherlands). "Systems and methods of controlling gas flows in semicondu... Read More