ALEXANDRIA, Va., Sept. 8 -- United States Patent no. 12,731,764, issued on Sept. 8, was assigned to Tokyo Electron Ltd. (Tokyo). "Substrate processing method and plasma processing apparatus" was inve... Read More
ALEXANDRIA, Va., Sept. 8 -- United States Patent no. 12,731,765, issued on Sept. 8, was assigned to Tokyo Electron Ltd. (Tokyo). "Substrate processing method and substrate processing apparatus" was i... Read More
ALEXANDRIA, Va., Sept. 8 -- United States Patent no. 12,731,766, issued on Sept. 8, was assigned to BEIJING NAURA MICROELECTRONICS EQUIPMENT Co. LTD. (Beijing). "Substrate support including multiple ... Read More
ALEXANDRIA, Va., Sept. 8 -- United States Patent no. 12,731,767, issued on Sept. 8, was assigned to Applied Materials Inc. (Santa Clara, Calif.). "Chucking status detection with chucking sensor norma... Read More
ALEXANDRIA, Va., Sept. 8 -- United States Patent no. 12,731,768, issued on Sept. 8, was assigned to HITACHI HIGH-TECH Corp. (Tokyo). "Plasma processing apparatus" was invented by Yuki Tanaka (Tokyo),... Read More
ALEXANDRIA, Va., Sept. 8 -- United States Patent no. 12,731,769, issued on Sept. 8, was assigned to Applied Materials Inc. (Santa Clara, Calif.). "Higher pressure purge for impurity reduction in radi... Read More
ALEXANDRIA, Va., Sept. 8 -- United States Patent no. 12,731,770, issued on Sept. 8, was assigned to SAMSUNG ELECTRONICS Co. LTD. (Suwon-si, South Korea) and Korea Institute of Machinery & Materials (D... Read More
ALEXANDRIA, Va., Sept. 8 -- United States Patent no. 12,731,771, issued on Sept. 8, was assigned to Applied Materials Inc. (Santa Clara, Calif.). "Lower deposition chamber CCP electrode cleaning solu... Read More
ALEXANDRIA, Va., Sept. 8 -- United States Patent no. 12,731,772, issued on Sept. 8, was assigned to Tokyo Electron Ltd. (Tokyo). "Plasma measuring method and plasma processing apparatus" was invented... Read More
ALEXANDRIA, Va., Sept. 8 -- United States Patent no. 12,731,773, issued on Sept. 8, was assigned to Micromass UK Ltd. (Wilmslow, Great Britain). "User interface for ion mobility separation device" wa... Read More