US Patent Issued to Samsung SDI, SAMSUNG ELECTRONICS on May 19 for "Method for forming photoresist patterns" (South Korean Inventors)

ALEXANDRIA, Va., May 19 -- United States Patent no. 12,631,966, issued on May 19, was assigned to Samsung SDI Co. Ltd. (Yongin-si, South Korea) and SAMSUNG ELECTRONICS Co. Ltd. (Suwon-si, South Korea)... Read More

US Patent Issued to SAMSUNG ELECTRONICS on May 19 for "Substrate processing apparatus and substrate processing method" (South Korean Inventors)

ALEXANDRIA, Va., May 19 -- United States Patent no. 12,631,967, issued on May 19, was assigned to SAMSUNG ELECTRONICS Co. LTD. (Suwon-si, South Korea). "Substrate processing apparatus and substrate p... Read More

US Patent Issued to ASML NETHERLANDS, ASML HOLDING on May 19 for "Metrology system and coherence adjusters" (Dutch, American Inventors)

ALEXANDRIA, Va., May 19 -- United States Patent no. 12,631,968, issued on May 19, was assigned to ASML NETHERLANDS B.V. (Veldhoven, Netherlands) and ASML HOLDING N.V. (Veldhoven, Netherlands). "Metro... Read More

US Patent Issued to ASML NETHERLANDS on May 19 for "Imaging via zeroth order suppression" (Dutch, American Inventors)

ALEXANDRIA, Va., May 19 -- United States Patent no. 12,631,970, issued on May 19, was assigned to ASML NETHERLANDS B.V. (Veldhoven, Netherlands). "Imaging via zeroth order suppression" was invented b... Read More

US Patent Issued to SAMSUNG ELECTRONICS, Korea Advanced Institute of Science and Technology on May 19 for "Immersion lithographic system" (South Korean Inventors)

ALEXANDRIA, Va., May 19 -- United States Patent no. 12,631,971, issued on May 19, was assigned to SAMSUNG ELECTRONICS Co. Ltd. (Gyeonggi-do, South Korea) and Korea Advanced Institute of Science and Te... Read More

US Patent Issued to CANON on May 19 for "Method of diagnosing failure location of control apparatus, diagnostic apparatus, control apparatus, lithography apparatus, article manufacturing method, and non-transitory computer-readable storage medium" (Japanese Inventors)

ALEXANDRIA, Va., May 19 -- United States Patent no. 12,631,972, issued on May 19, was assigned to CANON K.K. (Tokyo). "Method of diagnosing failure location of control apparatus, diagnostic apparatus... Read More

US Patent Issued to TAIWAN SEMICONDUCTOR MANUFACTURING on May 19 for "Overlay measurement structures having overlapping patterns" (Taiwanese Inventor)

ALEXANDRIA, Va., May 19 -- United States Patent no. 12,631,973, issued on May 19, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan). "Overlay measurement structures ha... Read More

US Patent Issued to ASML Netherlands on May 19 for "Assembly for separating radiation in the far field" (Dutch Inventors)

ALEXANDRIA, Va., May 19 -- United States Patent no. 12,631,974, issued on May 19, was assigned to ASML Netherlands B.V. (Veldhoven, Netherlands). "Assembly for separating radiation in the far field" ... Read More

US Patent Issued to ASML Holding on May 19 for "Metrology systems with phased arrays for contaminant detection and microscopy" (Connecticut Inventors)

ALEXANDRIA, Va., May 19 -- United States Patent no. 12,631,975, issued on May 19, was assigned to ASML Holding N.V. (Veldhoven, Netherlands). "Metrology systems with phased arrays for contaminant det... Read More

US Patent Issued to ASML NETHERLANDS on May 19 for "Method of reducing cyclic error effects in a lithographic process, projection system and lithographic apparatus comprising a projection system" (Dutch Inventors)

ALEXANDRIA, Va., May 19 -- United States Patent no. 12,631,976, issued on May 19, was assigned to ASML NETHERLANDS B.V. (Veldhoven, Netherlands). "Method of reducing cyclic error effects in a lithogr... Read More

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