ALEXANDRIA, Va., May 19 -- United States Patent no. 12,631,966, issued on May 19, was assigned to Samsung SDI Co. Ltd. (Yongin-si, South Korea) and SAMSUNG ELECTRONICS Co. Ltd. (Suwon-si, South Korea).
"Method for forming photoresist patterns" was invented by Ran Namgung (Suwon-si, South Korea), Shinhyo Bae (Suwon-si, South Korea), Hyeon Park (Suwon-si, South Korea), Daeseok Song (Suwon-si, South Korea), Minki Chon (Suwon-si, South Korea), Jun Soo Kim (Hwaseong-si, South Korea), Hyun-Woo Kim (Seongnam-si, South Korea), Hyun-Ji Song (Anyang-si, South Korea), Young Joo Choi (Hwaseong-si, South Korea) and Suk-Koo Hong (Hwaseong-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "A method of forming a...