US Patent Issued to ASML NETHERLANDS on May 19 for "Imaging via zeroth order suppression" (Dutch, American Inventors)

ALEXANDRIA, Va., May 19 -- United States Patent no. 12,631,970, issued on May 19, was assigned to ASML NETHERLANDS B.V. (Veldhoven, Netherlands).

"Imaging via zeroth order suppression" was invented by Johannes Jacobus Matheus Baselmans (Oirschot, Netherlands), Duan-Fu Stephen Hsu (Fremont, Calif.), Willem Jan Bouman (Moergestel, Netherlands), Frank Jan Timmermans (Eindhoven, Netherlands) and Marie-Claire Van Lare (Utrecht, Netherlands).

According to the abstract* released by the U.S. Patent & Trademark Office: "Apparatuses and techniques for suppressing a zeroth order portion of a configured radiation beam. In some embodiments, an extreme ultraviolet (EUV) lithographic apparatus for forming an image on a substrate by use of an EUV radiati...