ALEXANDRIA, Va., May 19 -- United States Patent no. 12,631,971, issued on May 19, was assigned to SAMSUNG ELECTRONICS Co. Ltd. (Gyeonggi-do, South Korea) and Korea Advanced Institute of Science and Technology (Daejeon, South Korea).

"Immersion lithographic system" was invented by Wonki Lee (Suwon-si, South Korea), Hyoungsoo Kim (Daejeon, South Korea), Junill Ryu (Daejeon, South Korea), Namil Koo (Suwon-si, South Korea), Jongmin Yoon (Suwon-si, South Korea), Suhwan Park (Suwon-si, South Korea), Sangyeon Oh (Suwon-si, South Korea) and Gilgu Lee (Daejeon, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "An immersion lithographic system may include a wafer stage configured to support a wafer, a project...