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US Patent Issued to Tokyo Electron on Nov. 3 for "Method and system for plasma process" (Texas, New York Inventors)

ALEXANDRIA, Va., Nov. 3 -- United States Patent no. 12,785,039, issued on Nov. 3, was assigned to Tokyo Electron Ltd. (Tokyo). "Method and system for plasma process" was invented by Evrim Solmaz (Aus... Read More


US Patent Issued to SAMSUNG ELECTRONICS, New Power Plasma on Nov. 3 for "Substrate processing apparatus" (South Korean Inventors)

ALEXANDRIA, Va., Nov. 3 -- United States Patent no. 12,785,040, issued on Nov. 3, was assigned to SAMSUNG ELECTRONICS Co. Ltd. (Gyeonggi-do, South Korea) and New Power Plasma Co. Ltd. (Gyeonggi-do, So... Read More


US Patent Issued to Applied Materials on Nov. 3 for "Control and prediction of multiple plasma coupling surfaces and corresponding power transfer" (New York, California Inventors)

ALEXANDRIA, Va., Nov. 3 -- United States Patent no. 12,785,041, issued on Nov. 3, was assigned to Applied Materials Inc. (Santa Clara, Calif.). "Control and prediction of multiple plasma coupling sur... Read More


US Patent Issued to LAM RESEARCH on Nov. 3 for "Photoelectron assisted plasma ignition" (Oregon, Texas Inventors)

ALEXANDRIA, Va., Nov. 3 -- United States Patent no. 12,785,043, issued on Nov. 3, was assigned to LAM RESEARCH Corp. (Fremont, Calif.). "Photoelectron assisted plasma ignition" was invented by Lee Ch... Read More


US Patent Issued to Applied Materials on Nov. 3 for "Semiconductor manufacturing process chamber cooling flange for remote plasma source supply" (Indian, American Inventors)

ALEXANDRIA, Va., Nov. 3 -- United States Patent no. 12,785,044, issued on Nov. 3, was assigned to Applied Materials Inc. (Santa Clara, Calif.). "Semiconductor manufacturing process chamber cooling fl... Read More


US Patent Issued to ABIT TECHNOLOGIES on Nov. 3 for "Microwave plasma generating apparatus, microwave plasma processing apparatus, and microwave plasma processing method" (Japanese Inventors)

ALEXANDRIA, Va., Nov. 3 -- United States Patent no. 12,785,045, issued on Nov. 3, was assigned to ABIT TECHNOLOGIES Co. LTD (Tokyo). "Microwave plasma generating apparatus, microwave plasma processin... Read More


US Patent Issued to Tokyo Electron on Nov. 3 for "Etching method and plasma processing apparatus" (Japanese, American Inventors)

ALEXANDRIA, Va., Nov. 3 -- United States Patent no. 12,785,046, issued on Nov. 3, was assigned to Tokyo Electron Ltd. (Tokyo). "Etching method and plasma processing apparatus" was invented by Ryo Mat... Read More


US Patent Issued to Kuwana Metals on Nov. 3 for "Method for supplying associative gas to semiconductor manufacturing apparatus" (Japanese Inventor)

ALEXANDRIA, Va., Nov. 3 -- United States Patent no. 12,785,047, issued on Nov. 3, was assigned to Kuwana Metals Ltd. (Japan). "Method for supplying associative gas to semiconductor manufacturing appa... Read More


US Patent Issued to Kyocera on Nov. 3 for "Plasma-resistant laminate, manufacturing method therefor, and plasma processing apparatus" (Japanese Inventors)

ALEXANDRIA, Va., Nov. 3 -- United States Patent no. 12,785,048, issued on Nov. 3, was assigned to Kyocera Corp. (Kyoto, Japan). "Plasma-resistant laminate, manufacturing method therefor, and plasma p... Read More


US Patent Issued to HANA MATERIALS on Nov. 3 for "Focus ring and method for manufacturing the same" (South Korean Inventors)

ALEXANDRIA, Va., Nov. 3 -- United States Patent no. 12,785,049, issued on Nov. 3, was assigned to HANA MATERIALS INC. (Cheonan-Si, South Korea). "Focus ring and method for manufacturing the same" was... Read More