US Patent Issued to LuminaMask on Nov. 3 for "Method of cleaning substrate for blank mask, substrate for blank mask, and blank mask including the same" (South Korean Inventors)

पोस्टेड ऑन: 2026-11-03

ALEXANDRIA, Va., Nov. 3 -- United States Patent no. 12,782,805, issued on Nov. 3, was assigned to LuminaMask Co. Ltd. (Cheonan-si, South Korea). "Method of cleaning substrate for blank mask, substrat... और पढ़ें

US Patent Issued to CANON on Nov. 3 for "Film forming method, film forming apparatus, and article manufacturing method" (Japanese Inventors)

पोस्टेड ऑन: 2026-11-03

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ALEXANDRIA, Va., Nov. 3 -- United States Patent no. 12,782,806, issued on Nov. 3, was assigned to CANON K.K. (Tokyo). "Film forming method, film forming apparatus, and article manufacturing method" w... और पढ़ें

US Patent Issued to Dai Nippon Printing on Nov. 3 for "Production method of template, template blank, and template substrate for imprinting, production method of template for imprinting, and template" (Japanese Inventors)

पोस्टेड ऑन: 2026-11-03

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ALEXANDRIA, Va., Nov. 3 -- United States Patent no. 12,782,807, issued on Nov. 3, was assigned to Dai Nippon Printing Co. Ltd. (Tokyo). "Production method of template, template blank, and template su... और पढ़ें

US Patent Issued to Taiwan Semiconductor Manufacturing on Nov. 3 for "Chemical composition for tri-layer removal" (Taiwanese Inventors)

पोस्टेड ऑन: 2026-11-03

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ALEXANDRIA, Va., Nov. 3 -- United States Patent no. 12,782,808, issued on Nov. 3, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan). "Chemical composition for tri-layer re... और पढ़ें

US Patent Issued to CHANGZHOU TRONLY NEW ELECTRONIC MATERIALS, CHANGZHOU TRONLY ADVANCED ELECTRONIC MATERIALS on Nov. 3 for "EO/PO-modified 9-phenylacridine photosensitizers and application thereof" (Chinese Inventor)

पोस्टेड ऑन: 2026-11-03

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ALEXANDRIA, Va., Nov. 3 -- United States Patent no. 12,782,810, issued on Nov. 3, was assigned to CHANGZHOU TRONLY NEW ELECTRONIC MATERIALS Co. LTD. (Jiangsu, China) and CHANGZHOU TRONLY ADVANCED ELEC... और पढ़ें

US Patent Issued to PROMERUS on Nov. 3 for "Dual catalyst system for mass romp and cationic polymerizable compositions" (Ohio Inventor)

पोस्टेड ऑन: 2026-11-03

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ALEXANDRIA, Va., Nov. 3 -- United States Patent no. 12,782,811, issued on Nov. 3, was assigned to PROMERUS LLC (Akron, Ohio). "Dual catalyst system for mass romp and cationic polymerizable compositio... और पढ़ें

US Patent Issued to DUK SAN NEOLUX on Nov. 3 for "Photosensitive composition comprising inorganic particle" (South Korean Inventors)

पोस्टेड ऑन: 2026-11-03

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ALEXANDRIA, Va., Nov. 3 -- United States Patent no. 12,782,813, issued on Nov. 3, was assigned to DUK SAN NEOLUX Co. LTD. (Cheonan-si, South Korea). "Photosensitive composition comprising inorganic p... और पढ़ें

US Patent Issued to TORAY INDUSTRIES on Nov. 3 for "Photosensitive resin printing plate precursor, and method of manufacturing printing plate using said precursor" (Japanese Inventors)

पोस्टेड ऑन: 2026-11-03

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ALEXANDRIA, Va., Nov. 3 -- United States Patent no. 12,782,814, issued on Nov. 3, was assigned to TORAY INDUSTRIES Inc. (Tokyo). "Photosensitive resin printing plate precursor, and method of manufact... और पढ़ें

US Patent Issued to ASM IP Holding on Nov. 3 for "Method of forming a photoresist absorber layer and structure including same" (Belgian, Finnish Inventors)

पोस्टेड ऑन: 2026-11-03

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ALEXANDRIA, Va., Nov. 3 -- United States Patent no. 12,782,815, issued on Nov. 3, was assigned to ASM IP Holding B.V. (Almere, Netherlands). "Method of forming a photoresist absorber layer and struct... और पढ़ें

US Patent Issued to TAIWAN SEMICONDUCTOR MANUFACTURING on Nov. 3 for "Underlayer composition and method of manufacturing a semiconductor device" (Taiwanese Inventor)

पोस्टेड ऑन: 2026-11-03

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ALEXANDRIA, Va., Nov. 3 -- United States Patent no. 12,782,816, issued on Nov. 3, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan). "Underlayer composition and method... और पढ़ें

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US Patent Issued to LuminaMask on Nov. 3 for "Method of cleaning substrate for blank mask, substrate for blank mask, and blank mask including the same" (South Korean Inventors)

US Patent Issued to CANON on Nov. 3 for "Film forming method, film forming apparatus, and article manufacturing method" (Japanese Inventors)

US Patent Issued to Dai Nippon Printing on Nov. 3 for "Production method of template, template blank, and template substrate for imprinting, production method of template for imprinting, and template" (Japanese Inventors)

US Patent Issued to Taiwan Semiconductor Manufacturing on Nov. 3 for "Chemical composition for tri-layer removal" (Taiwanese Inventors)

US Patent Issued to CHANGZHOU TRONLY NEW ELECTRONIC MATERIALS, CHANGZHOU TRONLY ADVANCED ELECTRONIC MATERIALS on Nov. 3 for "EO/PO-modified 9-phenylacridine photosensitizers and application thereof" (Chinese Inventor)

US Patent Issued to PROMERUS on Nov. 3 for "Dual catalyst system for mass romp and cationic polymerizable compositions" (Ohio Inventor)

US Patent Issued to DUK SAN NEOLUX on Nov. 3 for "Photosensitive composition comprising inorganic particle" (South Korean Inventors)

US Patent Issued to TORAY INDUSTRIES on Nov. 3 for "Photosensitive resin printing plate precursor, and method of manufacturing printing plate using said precursor" (Japanese Inventors)

US Patent Issued to ASM IP Holding on Nov. 3 for "Method of forming a photoresist absorber layer and structure including same" (Belgian, Finnish Inventors)

US Patent Issued to TAIWAN SEMICONDUCTOR MANUFACTURING on Nov. 3 for "Underlayer composition and method of manufacturing a semiconductor device" (Taiwanese Inventor)