US Patent Issued to LuminaMask on Nov. 3 for "Method of cleaning substrate for blank mask, substrate for blank mask, and blank mask including the same" (South Korean Inventors)

ALEXANDRIA, Va., Nov. 3 -- United States Patent no. 12,782,805, issued on Nov. 3, was assigned to LuminaMask Co. Ltd. (Cheonan-si, South Korea).

"Method of cleaning substrate for blank mask, substrate for blank mask, and blank mask including the same" was invented by Taewan Kim (Seoul, South Korea), GeonGon Lee (Seoul, South Korea), Suk Young Choi (Seoul, South Korea), Suhyeon Kim (Seoul, South Korea), Sung Hoon Son (Seoul, South Korea), Seong Yoon Kim (Seoul, South Korea), Min Gyo Jeong (Seoul, South Korea), Hahyeon Cho (Seoul, South Korea), Inkyun Shin (Seoul, South Korea) and Hyung-joo Lee (Seoul, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method of cleaning a substrate for a blank mask ...