US Patent Issued to ASM IP Holding on Nov. 3 for "Method of forming a photoresist absorber layer and structure including same" (Belgian, Finnish Inventors)

ALEXANDRIA, Va., Nov. 3 -- United States Patent no. 12,782,815, issued on Nov. 3, was assigned to ASM IP Holding B.V. (Almere, Netherlands).

"Method of forming a photoresist absorber layer and structure including same" was invented by Hannu Huotari (Helsinki), Daniele Piumi (Etterbeek, Belgium), Yoann Tomczak (Leuven, Belgium), Ivan Zyulkov (Brussels), Charles Dezelah (Helsinki), Arpita Saha (Espoo, Finland), David de Roest (Leuven, Belgium), Jerome Innocent (Leuven, Belgium), Michael Givens (Oud-Heverlee, Belgium) and Monica Thukkaram (Ghent, Belgium).

According to the abstract* released by the U.S. Patent & Trademark Office: "Methods of forming structures including a photoresist absorber layer and structures including the photoresist ab...