US Patent Issued to DUK SAN NEOLUX on Nov. 3 for "Photosensitive composition comprising inorganic particle" (South Korean Inventors)

ALEXANDRIA, Va., Nov. 3 -- United States Patent no. 12,782,813, issued on Nov. 3, was assigned to DUK SAN NEOLUX Co. LTD. (Cheonan-si, South Korea).

"Photosensitive composition comprising inorganic particle" was invented by Changmin Lee (Cheonan-si, South Korea), Yun Jong Ko (Cheonan-si, South Korea), Jun Bae (Cheonan-si, South Korea), Jun Ki Kim (Cheonan-si, South Korea), Jin Hyun Kim (Cheonan-si, South Korea), Younghoon Kang (Cheonan-si, South Korea) and Soung Yun Mun (Cheonan-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "Provided are a photosensitive composition prepared with silica particles having a reactive functional group introduced to their surface, thereby having high photosensitiv...