ALEXANDRIA, Va., Nov. 3 -- United States Patent no. 12,782,808, issued on Nov. 3, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan).
"Chemical composition for tri-layer removal" was invented by Li-Min Chen (Zhubei City, Taiwan), Kuo Bin Huang (Jhubei City, Taiwan), Neng-Jye Yang (Hsinchu, Taiwan), Chia-Wei Wu (Miaoli County, Taiwan) and Jian-Jou Lian (Tainan City, Taiwan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A method includes forming a tri-layer. The tri-layer includes a bottom layer; a middle layer over the bottom layer; and a top layer over the middle layer. The top layer includes a photo resist. The method further includes removing the top layer; and removing the middl...