US Patent Issued to INSTITUT POLYTECHNIQUE DE GRENOBLE, CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE, UNIVERSITE GRENOBLE ALPES on Sept. 29 for "Method for functionalizing a polymer-based substrate by chemical deposition of a thin layer" (French Inventors)

Posted On: 2026-09-30

ALEXANDRIA, Va., Sept. 30 -- United States Patent no. 12,747,495, issued on Sept. 29, was assigned to INSTITUT POLYTECHNIQUE DE GRENOBLE (Grenoble, France), CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQU... Read More

US Patent Issued to Tokyo Electron on Sept. 29 for "Film forming method and film forming apparatus" (Japanese, American Inventors)

Posted On: 2026-09-30

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ALEXANDRIA, Va., Sept. 30 -- United States Patent no. 12,747,496, issued on Sept. 29, was assigned to Tokyo Electron Ltd. (Tokyo). "Film forming method and film forming apparatus" was invented by Kaz... Read More

US Patent Issued to SAMSUNG ELECTRONICS on Sept. 29 for "Substrate processing tube, substrate processing apparatus including the same, and substrate processing method using the apparatus" (South Korean Inventors)

Posted On: 2026-09-30

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ALEXANDRIA, Va., Sept. 30 -- United States Patent no. 12,747,497, issued on Sept. 29, was assigned to SAMSUNG ELECTRONICS Co. LTD. (Suwon-si, South Korea). "Substrate processing tube, substrate proce... Read More

US Patent Issued to ASM IP Holding on Sept. 29 for "Method of forming dielectric material layer using plasma" (Japanese Inventors)

Posted On: 2026-09-30

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ALEXANDRIA, Va., Sept. 30 -- United States Patent no. 12,747,498, issued on Sept. 29, was assigned to ASM IP Holding B.V. (Almere, Netherlands). "Method of forming dielectric material layer using pla... Read More

US Patent Issued to BENEQ on Sept. 29 for "Atomic layer deposition apparatus" (Finnish Inventor)

Posted On: 2026-09-30

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ALEXANDRIA, Va., Sept. 30 -- United States Patent no. 12,747,499, issued on Sept. 29, was assigned to BENEQ OY (Espoo, Finland). "Atomic layer deposition apparatus" was invented by Pekka Soininen (Es... Read More

US Patent Issued to ASM IP Holding on Sept. 29 for "Liquid vaporizer" (Arizona Inventor)

Posted On: 2026-09-30

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ALEXANDRIA, Va., Sept. 30 -- United States Patent no. 12,747,500, issued on Sept. 29, was assigned to ASM IP Holding B.V. (Almere, Netherlands). "Liquid vaporizer" was invented by Jereld Lee Winkler ... Read More

US Patent Issued to KOKUSAI ELECTRIC on Sept. 29 for "Substrate processing apparatus, method of manufacturing semiconductor device, method of processing substrate, and recording medium" (Japanese Inventors)

Posted On: 2026-09-30

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ALEXANDRIA, Va., Sept. 30 -- United States Patent no. 12,747,501, issued on Sept. 29, was assigned to KOKUSAI ELECTRIC Corp. (Tokyo). "Substrate processing apparatus, method of manufacturing semicond... Read More

US Patent Issued to Applied Materials on Sept. 29 for "Plasma showerhead assembly and method of reducing defects" (California Inventors)

Posted On: 2026-09-30

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ALEXANDRIA, Va., Sept. 30 -- United States Patent no. 12,747,502, issued on Sept. 29, was assigned to Applied Materials Inc. (Santa Clara, Calif.). "Plasma showerhead assembly and method of reducing ... Read More

US Patent Issued to Tokyo Electron on Sept. 29 for "Parameter selection method and information processing device" (Japanese Inventor)

Posted On: 2026-09-30

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ALEXANDRIA, Va., Sept. 30 -- United States Patent no. 12,747,503, issued on Sept. 29, was assigned to Tokyo Electron Ltd. (Tokyo). "Parameter selection method and information processing device" was i... Read More

US Patent Issued to Tokyo Electron on Sept. 29 for "Substrate liquid processing apparatus and substrate liquid processing method" (Japanese Inventors)

Posted On: 2026-09-30

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ALEXANDRIA, Va., Sept. 30 -- United States Patent no. 12,747,504, issued on Sept. 29, was assigned to Tokyo Electron Ltd. (Tokyo). "Substrate liquid processing apparatus and substrate liquid processi... Read More

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US Patent Issued to INSTITUT POLYTECHNIQUE DE GRENOBLE, CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE, UNIVERSITE GRENOBLE ALPES on Sept. 29 for "Method for functionalizing a polymer-based substrate by chemical deposition of a thin layer" (French Inventors)

US Patent Issued to Tokyo Electron on Sept. 29 for "Film forming method and film forming apparatus" (Japanese, American Inventors)

US Patent Issued to SAMSUNG ELECTRONICS on Sept. 29 for "Substrate processing tube, substrate processing apparatus including the same, and substrate processing method using the apparatus" (South Korean Inventors)

US Patent Issued to ASM IP Holding on Sept. 29 for "Method of forming dielectric material layer using plasma" (Japanese Inventors)

US Patent Issued to BENEQ on Sept. 29 for "Atomic layer deposition apparatus" (Finnish Inventor)

US Patent Issued to ASM IP Holding on Sept. 29 for "Liquid vaporizer" (Arizona Inventor)

US Patent Issued to KOKUSAI ELECTRIC on Sept. 29 for "Substrate processing apparatus, method of manufacturing semiconductor device, method of processing substrate, and recording medium" (Japanese Inventors)

US Patent Issued to Applied Materials on Sept. 29 for "Plasma showerhead assembly and method of reducing defects" (California Inventors)

US Patent Issued to Tokyo Electron on Sept. 29 for "Parameter selection method and information processing device" (Japanese Inventor)

US Patent Issued to Tokyo Electron on Sept. 29 for "Substrate liquid processing apparatus and substrate liquid processing method" (Japanese Inventors)