US Patent Issued to Tokyo Electron on Sept. 29 for "Parameter selection method and information processing device" (Japanese Inventor)

ALEXANDRIA, Va., Sept. 30 -- United States Patent no. 12,747,503, issued on Sept. 29, was assigned to Tokyo Electron Ltd. (Tokyo).

"Parameter selection method and information processing device" was invented by Hidefumi Matsui (Nirasaki City, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A parameter selection method for causing a computer to execute processing steps including: (a) acquiring a plurality of parameters in measurement data of a plurality of sensors regarding a process in a substrate processing apparatus and result data of the process corresponding to the measurement data; (b) classifying the acquired parameters into a plurality of groups by a specific clustering method; (c) selecting param...