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US Patent Issued to Siltectra on July 21 for "Method for producing a layer of solid material" (German Inventors)

ALEXANDRIA, Va., July 21 -- United States Patent no. 12,690,429, issued on July 21, was assigned to Siltectra GmbH (Dresden, Germany). "Method for producing a layer of solid material" was invented by... Read More


US Patent Issued to Tokyo Electron on July 21 for "Formation of low-temperature and high-temperature in-situ doped source and drain epitaxy using selective heating for wrap-around contact and vertically stacked device architectures" (New York, Texas Inventors)

ALEXANDRIA, Va., July 21 -- United States Patent no. 12,690,430, issued on July 21, was assigned to Tokyo Electron Ltd. (Tokyo). "Formation of low-temperature and high-temperature in-situ doped sourc... Read More


US Patent Issued to KIOXIA on July 21 for "Method of manufacturing a semiconductor device by filling mask- defined trenches with an insulating film" (Japanese Inventor)

ALEXANDRIA, Va., July 21 -- United States Patent no. 12,690,431, issued on July 21, was assigned to KIOXIA Corp. (Tokyo). "Method of manufacturing a semiconductor device by filling mask- defined tren... Read More


US Patent Issued to Renesas Electronics on July 21 for "Semiconductor device and method of manufacturing the same" (Japanese Inventors)

ALEXANDRIA, Va., July 21 -- United States Patent no. 12,690,432, issued on July 21, was assigned to Renesas Electronics Corp. (Tokyo). "Semiconductor device and method of manufacturing the same" was ... Read More


US Patent Issued to TAIWAN SEMICONDUCTOR MANUFACTURING on July 21 for "Low resistance interconnect features and method for manufacturing the same" (Taiwanese Inventors)

ALEXANDRIA, Va., July 21 -- United States Patent no. 12,690,433, issued on July 21, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan). "Low resistance interconnect fea... Read More


US Patent Issued to Applied Materials on July 21 for "Surface depassivation with thermal etch after nitrogen radical treatment" (California Inventors)

ALEXANDRIA, Va., July 21 -- United States Patent no. 12,690,434, issued on July 21, was assigned to Applied Materials Inc. (Santa Clara, Calif.). "Surface depassivation with thermal etch after nitrog... Read More


US Patent Issued to INTERNATIONAL BUSINESS MACHINES on July 21 for "Self-aligned contact based via to backside power rail" (New York Inventors)

ALEXANDRIA, Va., July 21 -- United States Patent no. 12,690,435, issued on July 21, was assigned to INTERNATIONAL BUSINESS MACHINES Corp. (Armonk, N.Y.). "Self-aligned contact based via to backside p... Read More


US Patent Issued to TAIWAN SEMICONDUCTOR MANUFACTURING on July 21 for "Semiconductor interconnection structures and methods of forming the same" (Taiwanese Inventors)

ALEXANDRIA, Va., July 21 -- United States Patent no. 12,690,436, issued on July 21, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan). "Semiconductor interconnection s... Read More


US Patent Issued to Yangtze Memory Technologies on July 21 for "Semiconductor fabrication method with improved deposition quality and semiconductor structure thereof" (Chinese Inventors)

ALEXANDRIA, Va., July 21 -- United States Patent no. 12,690,437, issued on July 21, was assigned to Yangtze Memory Technologies Co. Ltd. (Wuhan, China). "Semiconductor fabrication method with improve... Read More


US Patent Issued to Celestial AI on July 21 for "Via formed in a wafer using a front-side and a back-side process" (California Inventors)

ALEXANDRIA, Va., July 21 -- United States Patent no. 12,690,438, issued on July 21, was assigned to Celestial AI Inc. (Santa Clara, Calif.). "Via formed in a wafer using a front-side and a back-side ... Read More