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US Patent Issued to Taiwan Semiconductor Manufacturing on July 21 for "FinFETs with low source/drain contact resistance" (Taiwanese Inventors)

ALEXANDRIA, Va., July 21 -- United States Patent no. 12,690,213, issued on July 21, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsin-chu, Taiwan). "FinFETs with low source/drain cont... Read More


US Patent Issued to INSTITUTE OF MICROELECTRONICS, CHINESE ACADEMY OF SCIENCES on July 21 for "Semiconductor device with spacer and C-shaped channel portion, method of manufacturing semiconductor device with spacer and C-shaped channel portion, and electronic apparatus" (New York Inventor)

ALEXANDRIA, Va., July 21 -- United States Patent no. 12,690,214, issued on July 21, was assigned to INSTITUTE OF MICROELECTRONICS, CHINESE ACADEMY OF SCIENCES (Beijing). "Semiconductor device with sp... Read More


US Patent Issued to Taiwan Semiconductor Manufacturing on July 21 for "Field effect transistor with gate isolation structure and method" (Taiwanese Inventors)

ALEXANDRIA, Va., July 21 -- United States Patent no. 12,690,215, issued on July 21, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan). "Field effect transistor with gate i... Read More


US Patent Issued to TAIWAN SEMICONDUCTOR MANUFACTURING on July 21 for "Structure and formation method of semiconductor device with semiconductor nanostructures" (Taiwanese Inventors)

ALEXANDRIA, Va., July 21 -- United States Patent no. 12,690,216, issued on July 21, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan). "Structure and formation method ... Read More


US Patent Issued to ROHM on July 21 for "Group III nitride semiconductor device with first and second conductive layers" (Japanese Inventor)

ALEXANDRIA, Va., July 21 -- United States Patent no. 12,690,217, issued on July 21, was assigned to ROHM Co. LTD. (Kyoto, Japan). "Group III nitride semiconductor device with first and second conduct... Read More


US Patent Issued to ENKRIS SEMICONDUCTOR on July 21 for "Semiconductor structures and manufacturing methods thereof" (Chinese Inventors)

ALEXANDRIA, Va., July 21 -- United States Patent no. 12,690,218, issued on July 21, was assigned to ENKRIS SEMICONDUCTOR INC. (Suzhou, China). "Semiconductor structures and manufacturing methods ther... Read More


US Patent Issued to ENKRIS SEMICONDUCTOR on July 21 for "Semiconductor structure comprising a channel layer, a barrier layer, and a P-type semiconductor layer, and manufacturing method having the same thereof" (Chinese Inventor)

ALEXANDRIA, Va., July 21 -- United States Patent no. 12,690,220, issued on July 21, was assigned to ENKRIS SEMICONDUCTOR INC. (Suzhou, China). "Semiconductor structure comprising a channel layer, a b... Read More


US Patent Issued to ENKRIS SEMICONDUCTOR on July 21 for "Semiconductor structure and manufacturing method thereof" (Chinese Inventor)

ALEXANDRIA, Va., July 21 -- United States Patent no. 12,690,221, issued on July 21, was assigned to ENKRIS SEMICONDUCTOR INC. (Suzhou, China). "Semiconductor structure and manufacturing method thereo... Read More


US Patent Issued to Applied Materials on July 21 for "Inner spacer liner for gate-all-around device" (California Inventors)

ALEXANDRIA, Va., July 21 -- United States Patent no. 12,690,222, issued on July 21, was assigned to Applied Materials Inc. (Santa Clara, Calif.). "Inner spacer liner for gate-all-around device" was i... Read More


US Patent Issued to Sony Group on July 21 for "Multi-threshold voltage devices and associated techniques and configurations" (Oregon Inventors)

ALEXANDRIA, Va., July 21 -- United States Patent no. 12,690,223, issued on July 21, was assigned to Sony Group Corp. (Kanagawa, Japan). "Multi-threshold voltage devices and associated techniques and ... Read More