US Patent Issued to Applied Materials on July 21 for "Inner spacer liner for gate-all-around device" (California Inventors)

ALEXANDRIA, Va., July 21 -- United States Patent no. 12,690,222, issued on July 21, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Inner spacer liner for gate-all-around device" was invented by Sai Hooi Yeong (Cupertino, Calif.), Liu Jiang (Dublin, Calif.), Susmit Singha Roy (Campbell, Calif.), Abhijit Basu Mallick (Sunnyvale, Calif.), Benjamin Colombeau (San Jose, Calif.), El Mehdi Bazizi (San Jose, Calif.) and Balasubramanian Pranatharthiharan (San Jose, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Semiconductor devices (e.g., gate-all-around (GAA) devices), process tools for manufacturing GAA devices and methods of manufacturing GAA devices, and inner spacer liners and inner space...