ALEXANDRIA, Va., July 21 -- United States Patent no. 12,689,003, issued on July 21, was assigned to Tokyo Electron Ltd. (Tokyo). "Film deposition apparatus" was invented by Taehoon Park (Gyeonggi-do,... और पढ़ें
ALEXANDRIA, Va., July 21 -- United States Patent no. 12,689,004, issued on July 21, was assigned to Tokyo Electron Ltd. (Tokyo) and The University of Shiga Prefecture (Shiga, Japan). "Plasma processi... और पढ़ें
ALEXANDRIA, Va., July 21 -- United States Patent no. 12,689,005, issued on July 21, was assigned to WONIK IPS Co. LTD. (Pyeongtaek-si, South Korea). "Substrate processing apparatus" was invented by Y... और पढ़ें
ALEXANDRIA, Va., July 21 -- United States Patent no. 12,689,006, issued on July 21, was assigned to Tokyo Electron Ltd. (Tokyo). "Etching method and plasma processing apparatus" was invented by Takas... और पढ़ें
ALEXANDRIA, Va., July 21 -- United States Patent no. 12,689,007, issued on July 21, was assigned to TOTO Ltd. (Fukuoka, Japan). "Structural member" was invented by Morio Hosokawa (Fukuoka, Japan) and... और पढ़ें
ALEXANDRIA, Va., July 21 -- United States Patent no. 12,689,009, issued on July 21, was assigned to Tokyo Electron Ltd. (Tokyo). "Substrate transfer system and transfer module" was invented by Toshia... और पढ़ें
ALEXANDRIA, Va., July 21 -- United States Patent no. 12,689,010, issued on July 21, was assigned to Applied Materials Inc. (Santa Clara, Calif.). "High efficiency trap for particle collection in a va... और पढ़ें
ALEXANDRIA, Va., July 21 -- United States Patent no. 12,689,011, issued on July 21, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan). "Apparatus with heated filter an... और पढ़ें
ALEXANDRIA, Va., July 21 -- United States Patent no. 12,689,012, issued on July 21, was assigned to Tokyo Electron Ltd. (Tokyo). "Ignition condition calculation method and plasma processing apparatus... और पढ़ें
ALEXANDRIA, Va., July 21 -- United States Patent no. 12,689,013, issued on July 21, was assigned to Tokyo Electron Ltd. (Tokyo). "Measuring device, measuring method, and vacuum processing apparatus" ... और पढ़ें