ALEXANDRIA, Va., July 21 -- United States Patent no. 12,689,005, issued on July 21, was assigned to WONIK IPS Co. LTD. (Pyeongtaek-si, South Korea).
"Substrate processing apparatus" was invented by Yong Taek Eom (Cheonan-si, South Korea), Kang Hee Kim (Osan-si, South Korea) and Hyun Kim (Gwangju-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "The present invention disclosed herein relates to a substrate processing apparatus, and more particularly, to a substrate processing apparatus capable of processing a substrate using plasma. A substrate processing apparatus includes: a process chamber having an opening in an upper portion thereof; a gas injection part coupled to the opening to define a pr...