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US Patent Issued to Infineon Technologies on Sept. 1 for "Semiconductor device including protruding region" (German Inventors)

ALEXANDRIA, Va., Sept. 1 -- United States Patent no. 12,727,184, issued on Sept. 1, was assigned to Infineon Technologies AG (Neubiberg, Germany). "Semiconductor device including protruding region" w... Read More


US Patent Issued to STMICROELECTRONICS on Sept. 1 for "HEMT transistor of the normally off type including a trench containing a gate region and forming at least one step, and corresponding manufacturing method" (Italian Inventors)

ALEXANDRIA, Va., Sept. 1 -- United States Patent no. 12,727,185, issued on Sept. 1, was assigned to STMICROELECTRONICS S.r.l. (Agrate Brianza, Italy). "HEMT transistor of the normally off type includ... Read More


US Patent Issued to Taiwan Semiconductor Manufacturing on Sept. 1 for "Controlled doping in a gate dielectric layer" (Taiwanese Inventors)

ALEXANDRIA, Va., Sept. 1 -- United States Patent no. 12,727,186, issued on Sept. 1, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan). "Controlled doping in a gate dielect... Read More


US Patent Issued to Taiwan Semiconductor Manufacturing on Sept. 1 for "Integrated circuit with pattern overlay for assisting overlay signal and accuracy" (Taiwanese Inventors)

ALEXANDRIA, Va., Sept. 1 -- United States Patent no. 12,727,187, issued on Sept. 1, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan). "Integrated circuit with pattern ove... Read More


US Patent Issued to SAMSUNG ELECTRONICS on Sept. 1 for "Semiconductor device and method of fabricating the same" (South Korean Inventors)

ALEXANDRIA, Va., Sept. 1 -- United States Patent no. 12,727,188, issued on Sept. 1, was assigned to SAMSUNG ELECTRONICS Co. LTD. (Suwon-si, South Korea). "Semiconductor device and method of fabricati... Read More


US Patent Issued to UNITED MICROELECTRONICS on Sept. 1 for "Method for fabricating high electron mobility transistor" (Taiwanese Inventors)

ALEXANDRIA, Va., Sept. 1 -- United States Patent no. 12,727,189, issued on Sept. 1, was assigned to UNITED MICROELECTRONICS CORP. (Hsin-Chu City, Taiwan). "Method for fabricating high electron mobili... Read More


US Patent Issued to SAMSUNG ELECTRONICS on Sept. 1 for "Semiconductor device including inclined channel layer and electronic device including the semiconductor device" (South Korean Inventors)

ALEXANDRIA, Va., Sept. 1 -- United States Patent no. 12,727,190, issued on Sept. 1, was assigned to SAMSUNG ELECTRONICS Co. Ltd. (Gyeonggi-do, South Korea). "Semiconductor device including inclined c... Read More


US Patent Issued to International Business Machines on Sept. 1 for "Multiple fin heights for effective width tuning" (New York Inventors)

ALEXANDRIA, Va., Sept. 1 -- United States Patent no. 12,727,191, issued on Sept. 1, was assigned to International Business Machines Corp. (Armonk, N.Y.). "Multiple fin heights for effective width tun... Read More


US Patent Issued to SHANGHAI BRIGHT POWER SEMICONDUCTOR on Sept. 1 for "Metal-oxide semiconductor field-effect transistor having enhanced high-frequency performance" (Chinese Inventors)

ALEXANDRIA, Va., Sept. 1 -- United States Patent no. 12,727,192, issued on Sept. 1, was assigned to SHANGHAI BRIGHT POWER SEMICONDUCTOR Co. LTD. (Shanghai). "Metal-oxide semiconductor field-effect tr... Read More


US Patent Issued to UNITED MICROELECTRONICS on Sept. 1 for "FinFET LDMOS device" (Taiwanese Inventors)

ALEXANDRIA, Va., Sept. 1 -- United States Patent no. 12,727,193, issued on Sept. 1, was assigned to UNITED MICROELECTRONICS CORP. (Hsin-Chu City, Taiwan). "FinFET LDMOS device" was invented by Yi Chu... Read More