ALEXANDRIA, Va., Sept. 1 -- United States Patent no. 12,727,191, issued on Sept. 1, was assigned to International Business Machines Corp. (Armonk, N.Y.).
"Multiple fin heights for effective width tuning" was invented by William Murphy Parkin (Troy, N.Y.), Susan Ng Emans (Albany, N.Y.), Julien Frougier (Albany, N.Y.), Ruilong Xie (Niskayuna, N.Y.) and Andrew M. Greene (Slingerlands, N.Y.).
According to the abstract* released by the U.S. Patent & Trademark Office: "Embodiments of the present disclosure are directed to co-integrating multiple fin heights with bottom dielectric isolations for effective width tuning. In a non-limiting embodiment, a semiconductor structure includes a first shallow trench isolation (STI) region formed over a fir...