Publication

Byline

Location

US Patent Issued to ASM IP Holding on Oct. 20 for "Method for depositing phosphorus containing silicon layer" (Belgian, American Inventors)

ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,772,752, issued on Oct. 20, was assigned to ASM IP Holding B.V. (Almere, Netherlands). "Method for depositing phosphorus containing silicon lay... और पढ़ें


US Patent Issued to Fraunhofer-Gesellschaft zur Forderung der angewandten Forschung on Oct. 20 for "Method for preparing a germanium substrate and germanium substrate structure for epitaxial growth of a germanium layer" (German Inventors)

ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,772,753, issued on Oct. 20, was assigned to Fraunhofer-Gesellschaft zur Forderung der angewandten Forschung e.V. (Munich). "Method for preparin... और पढ़ें


US Patent Issued to ASM IP Holding on Oct. 20 for "Method to reduce bending of features on a surface of a substrate and structure formed using same" (Arizona Inventors)

ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,772,754, issued on Oct. 20, was assigned to ASM IP Holding B.V. (Almere, Netherlands). "Method to reduce bending of features on a surface of a ... और पढ़ें


US Patent Issued to Applied Materials on Oct. 20 for "Contact layer formation with microwave annealing for NMOS devices" (California Inventors)

ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,772,755, issued on Oct. 20, was assigned to Applied Materials Inc. (Santa Clara, Calif.). "Contact layer formation with microwave annealing for... और पढ़ें


US Patent Issued to SEMES on Oct. 20 for "Insulation plate and substrate processing apparatus including the same" (South Korean Inventors)

ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,772,756, issued on Oct. 20, was assigned to SEMES Co. LTD. (Chungcheongnam-Do, South Korea). "Insulation plate and substrate processing apparat... और पढ़ें


US Patent Issued to ASM IP Holding on Oct. 20 for "Substrate processing method" (South Korean Inventors)

ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,772,757, issued on Oct. 20, was assigned to ASM IP Holding B.V. (Almere, Netherlands). "Substrate processing method" was invented by SangHeon Y... और पढ़ें


US Patent Issued to NANYA TECHNOLOGY on Oct. 20 for "Method of manufacturing semiconductor structure" (Taiwanese Inventor)

ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,772,758, issued on Oct. 20, was assigned to NANYA TECHNOLOGY Corp. (New Taipei City, Taiwan). "Method of manufacturing semiconductor structure"... और पढ़ें


US Patent Issued to JUSUNG ENGINEERING on Oct. 20 for "Thin film deposition method" (South Korean Inventors)

ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,772,759, issued on Oct. 20, was assigned to JUSUNG ENGINEERING Co. LTD. (South Korea). "Thin film deposition method" was invented by Yoon Jeong... और पढ़ें


US Patent Issued to ASM IP Holding on Oct. 20 for "Methods of filling trenches on substrate surface" (Japanese Inventors)

ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,772,760, issued on Oct. 20, was assigned to ASM IP Holding B.V. (Almere, Netherlands). "Methods of filling trenches on substrate surface" was i... और पढ़ें


US Patent Issued to Applied Materials on Oct. 20 for "Growth monitor system and methods for film deposition" (California Inventors)

ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,772,761, issued on Oct. 20, was assigned to Applied Materials Inc. (Santa Clara, Calif.). "Growth monitor system and methods for film depositio... और पढ़ें