US Patent Issued to JUSUNG ENGINEERING on Oct. 20 for "Thin film deposition method" (South Korean Inventors)

ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,772,759, issued on Oct. 20, was assigned to JUSUNG ENGINEERING Co. LTD. (South Korea).

"Thin film deposition method" was invented by Yoon Jeong Kim (Gwangju-Si, South Korea), Jung Kyun Lee (Gwangju-Si, South Korea) and Chul Joo Hwang (Gwangju-Si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present disclosure relates to a method for depositing a thin film, and more particularly, to a method for depositing a thin film, which forms a gate insulation film on a silicon carbide substrate.In accordance with an exemplary embodiment, a method for depositing a thin film includes: preparing a silicon carbide substrate having a plurality of semic...