US Patent Issued to HITACHI HIGH-TECH on June 2 for "Plasma processing method" (Japanese Inventors)

ALEXANDRIA, Va., June 2 -- United States Patent no. 12,646,689, issued on June 2, was assigned to HITACHI HIGH-TECH Corp. (Tokyo). "Plasma processing method" was invented by Makoto Satake (Tokyo), Ta... Read More

US Patent Issued to Taiwan Semiconductor Manufacturing on June 2 for "Focus ring for a plasma-based semiconductor processing tool" (Taiwanese Inventors)

ALEXANDRIA, Va., June 2 -- United States Patent no. 12,646,690, issued on June 2, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan). "Focus ring for a plasma-based semicon... Read More

US Patent Issued to NGK INSULATORS on June 2 for "Wafer placement table" (Japanese Inventors)

ALEXANDRIA, Va., June 2 -- United States Patent no. 12,646,691, issued on June 2, was assigned to NGK INSULATORS Ltd. (Nagoya, Japan). "Wafer placement table" was invented by Hiroshi Takebayashi (Han... Read More

US Patent Issued to Hitachi High-Tech on June 2 for "Plasma processing method and plasma processing device" (Japanese Inventors)

ALEXANDRIA, Va., June 2 -- United States Patent no. 12,646,692, issued on June 2, was assigned to Hitachi High-Tech Corp. (Tokyo). "Plasma processing method and plasma processing device" was invented... Read More

US Patent Issued to Tokyo Electron on June 2 for "Processing method and plasma processing apparatus" (Japanese Inventors)

ALEXANDRIA, Va., June 2 -- United States Patent no. 12,646,693, issued on June 2, was assigned to Tokyo Electron Ltd. (Tokyo). "Processing method and plasma processing apparatus" was invented by Kazu... Read More

US Patent Issued to UVAT TECHNOLOGY on June 2 for "Continuous plasma processing system with adjustable electrode" (Taiwanese Inventors)

ALEXANDRIA, Va., June 2 -- United States Patent no. 12,646,694, issued on June 2, was assigned to UVAT TECHNOLOGY Co. LTD. (Taoyuan City, Taiwan). "Continuous plasma processing system with adjustable... Read More

US Patent Issued to Lam Research on June 2 for "Dry chamber clean of photoresist films" (California Inventors)

ALEXANDRIA, Va., June 2 -- United States Patent no. 12,646,695, issued on June 2, was assigned to Lam Research Corp. (Fremont, Calif.). "Dry chamber clean of photoresist films" was invented by Daniel... Read More

US Patent Issued to Industrial Technology Research Institute on June 2 for "Surface processing equipment" (Taiwanese Inventors)

ALEXANDRIA, Va., June 2 -- United States Patent no. 12,646,696, issued on June 2, was assigned to Industrial Technology Research Institute (Hsinchu, Taiwan). "Surface processing equipment" was invent... Read More

US Patent Issued to SAMSUNG ELECTRONICS on June 2 for "Plasma monitoring system and method of monitoring plasma" (South Korean Inventors)

ALEXANDRIA, Va., June 2 -- United States Patent no. 12,646,697, issued on June 2, was assigned to SAMSUNG ELECTRONICS Co. Ltd. (Suwon-si, South Korea). "Plasma monitoring system and method of monitor... Read More

US Patent Issued to SHIMADZU on June 2 for "Mass spectrometer and mass spectrometry method" (Japanese Inventor)

ALEXANDRIA, Va., June 2 -- United States Patent no. 12,646,698, issued on June 2, was assigned to SHIMADZU Corp. (Kyoto, Japan). "Mass spectrometer and mass spectrometry method" was invented by Hiden... Read More

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