US Patent Issued to UVAT TECHNOLOGY on June 2 for "Continuous plasma processing system with adjustable electrode" (Taiwanese Inventors)

ALEXANDRIA, Va., June 2 -- United States Patent no. 12,646,694, issued on June 2, was assigned to UVAT TECHNOLOGY Co. LTD. (Taoyuan City, Taiwan).

"Continuous plasma processing system with adjustable electrode" was invented by Yuan-Chi Lee (Taoyuan City, Taiwan), Pin-Chun Liu (Taoyuan City, Taiwan), Chun-Chieh Yang (Taoyuan City, Taiwan), Ming-Chan Tsai (Taoyuan City, Taiwan) and Chih-Ming Lu (Taoyuan City, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A continuous plasma processing system with adjustable electrode includes a frame shape carrier plate for holding a to-be-processed object, a loading chamber for inputting the to-be-processed object, a processing chamber, and an unloading chamber for ou...