US Patent Issued to Lam Research on June 2 for "Dry chamber clean of photoresist films" (California Inventors)

ALEXANDRIA, Va., June 2 -- United States Patent no. 12,646,695, issued on June 2, was assigned to Lam Research Corp. (Fremont, Calif.).

"Dry chamber clean of photoresist films" was invented by Daniel Peter (Sunnyvale, Calif.), Da Li (Newark, Calif.), Timothy William Weidman (Sunnyvale, Calif.), Boris Volosskiy (San Jose, Calif.), Chenghao Wu (Berkeley, Calif.), Katie Lynn Nardi (San Jose, Calif.), Kevin Li Gu (Mountain View, Calif.), Leon Taleh (San Jose, Calif.), Samantha Siamhwa Tan (Newark, Calif.), Jengyi Yu (San Ramon, Calif.) and Meng Xue (San Jose, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A metal-containing photoresist film may be deposited on a semiconductor substrate using a dry deposit...