US Patent Issued to SAMSUNG ELECTRONICS on June 2 for "Plasma monitoring system and method of monitoring plasma" (South Korean Inventors)

ALEXANDRIA, Va., June 2 -- United States Patent no. 12,646,697, issued on June 2, was assigned to SAMSUNG ELECTRONICS Co. Ltd. (Suwon-si, South Korea).

"Plasma monitoring system and method of monitoring plasma" was invented by Kwangho Lee (Suwon-si, South Korea), Sangki Nam (Suwon-si, South Korea), Jitae Park (Suwon-si, South Korea), Seongjin In (Suwon-si, South Korea), Keonhee Lim (Suwon-si, South Korea) and Sungho Jang (Suwon-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A plasma monitoring system includes a chamber with an internal space configured to perform a plasma process on a semiconductor substrate, the chamber including a view window and a substrate stage, a light transmitter on th...