US Patent Issued to SHIN-ETSU CHEMICAL on June 16 for "Resist composition and patterning process" (Japanese Inventors)

ALEXANDRIA, Va., June 16 -- United States Patent no. 12,656,683, issued on June 16, was assigned to SHIN-ETSU CHEMICAL Co. LTD. (Tokyo). "Resist composition and patterning process" was invented by Ta... Read More

US Patent Issued to NISSAN CHEMICAL on June 16 for "Film forming composition" (Japanese Inventors)

ALEXANDRIA, Va., June 16 -- United States Patent no. 12,656,685, issued on June 16, was assigned to NISSAN CHEMICAL Corp. (Tokyo). "Film forming composition" was invented by Wataru Shibayama (Toyama,... Read More

US Patent Issued to JSR on June 16 for "Resist underlayer film-forming composition, resist underlayer film, and method of producing semiconductor substrate" (Japanese Inventors)

ALEXANDRIA, Va., June 16 -- United States Patent no. 12,656,686, issued on June 16, was assigned to JSR Corp. (Tokyo). "Resist underlayer film-forming composition, resist underlayer film, and method ... Read More

US Patent Issued to Applied Materials on June 16 for "Low oxygen scanning UV source with localized purge" (American, Indian Inventors)

ALEXANDRIA, Va., June 16 -- United States Patent no. 12,656,688, issued on June 16, was assigned to Applied Materials Inc. (Santa Clara, Calif.). "Low oxygen scanning UV source with localized purge" ... Read More

US Patent Issued to University of Pittsburgh-Of the Commonwealth System of Higher Education, The Trustees of Columbia University In the City of New York on June 16 for "Systems and methods for forming topological lattices of plasmonic merons" (American, Taiwanese Inventors)

ALEXANDRIA, Va., June 16 -- United States Patent no. 12,656,689, issued on June 16, was assigned to University of Pittsburgh-Of the Commonwealth System of Higher Education (Pittsburgh) and The Trustee... Read More

US Patent Issued to Carl Zeiss SMT on June 16 for "Optical apparatus, method for setting a target deformation, and lithography system" (German Inventors)

ALEXANDRIA, Va., June 16 -- United States Patent no. 12,656,690, issued on June 16, was assigned to Carl Zeiss SMT GmbH (Oberkochen, Germany). "Optical apparatus, method for setting a target deformat... Read More

US Patent Issued to ASML NETHERLANDS on June 16 for "Optimization of scanner throughput and imaging quality for a patterning process" (California Inventors)

ALEXANDRIA, Va., June 16 -- United States Patent no. 12,656,691, issued on June 16, was assigned to ASML NETHERLANDS B.V. (Veldhoven, Netherlands). "Optimization of scanner throughput and imaging qua... Read More

US Patent Issued to SAMSUNG ELECTRONICS on June 16 for "Method of managing semiconductor processing apparatus" (South Korean Inventors)

ALEXANDRIA, Va., June 16 -- United States Patent no. 12,656,692, issued on June 16, was assigned to SAMSUNG ELECTRONICS Co. LTD. (Suwon-si, South Korea). "Method of managing semiconductor processing ... Read More

US Patent Issued to Carl Zeiss SMT on June 16 for "Optical system, lithography apparatus and method" (German Inventors)

ALEXANDRIA, Va., June 16 -- United States Patent no. 12,656,693, issued on June 16, was assigned to Carl Zeiss SMT GmbH (Oberkochen, Germany). "Optical system, lithography apparatus and method" was i... Read More

US Patent Issued to ASML Netherlands on June 16 for "Lithographic apparatus, illumination system, and connection sealing device with protective shield" (California Inventors)

ALEXANDRIA, Va., June 16 -- United States Patent no. 12,656,694, issued on June 16, was assigned to ASML Netherlands B.V. (Veldhoven, Netherlands). "Lithographic apparatus, illumination system, and c... Read More

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