US Patent Issued to SHIN-ETSU CHEMICAL on June 16 for "Resist composition and patterning process" (Japanese Inventors)

ALEXANDRIA, Va., June 16 -- United States Patent no. 12,656,683, issued on June 16, was assigned to SHIN-ETSU CHEMICAL Co. LTD. (Tokyo).

"Resist composition and patterning process" was invented by Takeshi Sasami (Joetsu, Japan), Masayoshi Sagehashi (Joetsu, Japan) and Kenji Yamada (Joetsu, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present invention is a resist composition, including: a resin (A) having: a repeating unit represented by the general formula (p-1); a repeating unit represented by the general formula (a-1); and a repeating unit represented by the general formula (b-1); a resin (B) having: a repeating unit represented by the general formula (p-2); a repeating unit represented by the...