US Patent Issued to NISSAN CHEMICAL on June 16 for "Film forming composition" (Japanese Inventors)

ALEXANDRIA, Va., June 16 -- United States Patent no. 12,656,685, issued on June 16, was assigned to NISSAN CHEMICAL Corp. (Tokyo).

"Film forming composition" was invented by Wataru Shibayama (Toyama, Japan), Yutaro Kuramoto (Toyama, Japan), Satoshi Takeda (Toyama, Japan), Shuhei Shigaki (Toyama, Japan), Ken Ishibashi (Toyama, Japan) and Makoto Nakajima (Toyama, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A film-forming composition is suitable as a resist underlayer film-forming composition capable of forming an Si-containing resist underlayer film that exhibits favorable adhesion to an EUV resist and favorable etching processability because of high rate of etching with fluorine. A film-forming compo...