US Patent Issued to Carl Zeiss SMT on June 16 for "Optical apparatus, method for setting a target deformation, and lithography system" (German Inventors)

ALEXANDRIA, Va., June 16 -- United States Patent no. 12,656,690, issued on June 16, was assigned to Carl Zeiss SMT GmbH (Oberkochen, Germany).

"Optical apparatus, method for setting a target deformation, and lithography system" was invented by Klaus Gwosch (Aalen, Germany), Pascal Heller (Giengen, Germany), Matthias Manger (Oberkochen, Germany) and Andreas Koeniger (Aalen, Germany).

According to the abstract* released by the U.S. Patent & Trademark Office: "An optical apparatus for a lithography system has at least one optical element comprising an optical surface. The optical apparatus also has one or more actuators for deforming the optical surface. The optical element comprises a strain gauge device for determining the deformation of t...