ALEXANDRIA, Va., April 21 -- United States Patent no. 12,610,761, issued on April 21, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan). "Metal etching with reduced ti... Read More
ALEXANDRIA, Va., April 21 -- United States Patent no. 12,610,762, issued on April 21, was assigned to The Board of Trustees of the University of Illinois (Urbana, Ill.). "Large area synthesis of cubi... Read More
ALEXANDRIA, Va., April 21 -- United States Patent no. 12,610,763, issued on April 21, was assigned to Tokyo Electron Ltd. (Tokyo). "Semiconductor devices and methods of manufacturing the same" was in... Read More
ALEXANDRIA, Va., April 21 -- United States Patent no. 12,610,764, issued on April 21, was assigned to Virginia Tech Intellectual Properties Inc. (Blacksburg, Va.). "Termination structures for semicon... Read More
ALEXANDRIA, Va., April 21 -- United States Patent no. 12,610,765, issued on April 21, was assigned to NANYA TECHNOLOGY Corp. (New Taipei City, Taiwan). "Manufacturing method of semiconductor device" ... Read More
ALEXANDRIA, Va., April 21 -- United States Patent no. 12,610,766, issued on April 21, was assigned to NANYA TECHNOLOGY Corp. (New Taipei City, Taiwan). "Method of patterning a semiconductor structure... Read More
ALEXANDRIA, Va., April 21 -- United States Patent no. 12,610,767, issued on April 21, was assigned to Wolfspeed Inc. (Durham, N.C.). "Additives for grinding semiconductor workpieces" was invented by ... Read More
ALEXANDRIA, Va., April 21 -- United States Patent no. 12,610,768, issued on April 21, was assigned to SAMSUNG ELECTRONICS Co. LTD. (Suwon-si, South Korea). "Method of processing a substrate" was inve... Read More
ALEXANDRIA, Va., April 21 -- United States Patent no. 12,610,769, issued on April 21, was assigned to DISCO Corp. (Tokyo). "Processing method" was invented by Naoko Yamamoto (Tokyo) and Tomoaki Sugiy... Read More
ALEXANDRIA, Va., April 21 -- United States Patent no. 12,610,770, issued on April 21, was assigned to SCREEN Holdings Co. Ltd. (Kyoto, Japan). "Substrate processing system and substrate processing me... Read More