ALEXANDRIA, Va., July 28 -- United States Patent no. 12,693,589, issued on July 28, was assigned to Coretronic Corp. (Hsin-Chu, Taiwan). "Illumination system and projection apparatus" was invented by... और पढ़ें
ALEXANDRIA, Va., July 28 -- United States Patent no. 12,693,590, issued on July 28, was assigned to ROBERT BOSCH GMBH (Stuttgart, Germany). "Printed circuit board with an image sensor for a camera de... और पढ़ें
ALEXANDRIA, Va., July 28 -- United States Patent no. 12,693,591, issued on July 28, was assigned to Intel Corp. (Santa Clara, Calif.). "Enhanced mask pattern-aware heuristics for optical proximity co... और पढ़ें
ALEXANDRIA, Va., July 28 -- United States Patent no. 12,693,592, issued on July 28, was assigned to ASML NETHERLANDS B.V. (Veldhoven, Netherlands). "Pellicle membrane for a lithographic apparatus" wa... और पढ़ें
ALEXANDRIA, Va., July 28 -- United States Patent no. 12,693,593, issued on July 28, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan). "Pattern formation method and ma... और पढ़ें
ALEXANDRIA, Va., July 28 -- United States Patent no. 12,693,594, issued on July 28, was assigned to Carl Zeiss SMT GmbH (Oberkochen, Germany). "Method and apparatus for characterization of a microlit... और पढ़ें
ALEXANDRIA, Va., July 28 -- United States Patent no. 12,693,595, issued on July 28, was assigned to SAMSUNG ELECTRONICS Co. LTD. (Suwon-si, South Korea) and INHA UNIVERSITY RESEARCH AND BUSINESS FOUND... और पढ़ें
ALEXANDRIA, Va., July 28 -- United States Patent no. 12,693,596, issued on July 28, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan). "Resist pump buffer tank and met... और पढ़ें
ALEXANDRIA, Va., July 28 -- United States Patent no. 12,693,597, issued on July 28, was assigned to Applied Materials Inc. (Santa Clara, Calif.). "Lithography stitching" was invented by Yongan Xu (Sa... और पढ़ें
ALEXANDRIA, Va., July 28 -- United States Patent no. 12,693,598, issued on July 28, was assigned to SEMES Co. LTD. (Chungcheongnam-do, South Korea). "Apparatus and method for processing substrate" wa... और पढ़ें