US Patent Issued to TAIWAN SEMICONDUCTOR MANUFACTURING on July 28 for "Pattern formation method and manufacturing method of semiconductor device" (Taiwanese Inventors)

ALEXANDRIA, Va., July 28 -- United States Patent no. 12,693,593, issued on July 28, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan).

"Pattern formation method and manufacturing method of semiconductor device" was invented by Wei-De Ho (Hsinchu City, Taiwan), Han-Wei Wu (Tainan City, Taiwan), Yuan-Hsiang Lung (Hsinchu City, Taiwan) and Hua-Tai Lin (Hsinchu City, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "In pattern formation method, a photomask is loaded into a lithography apparatus, an exposure light is applied to a photo resist layer formed over a substrate through or via the photomask, and the photo resist layer is developed. The photomask includes a plurality o...