US Patent Issued to Intel on July 28 for "Enhanced mask pattern-aware heuristics for optical proximity corrections for integrated circuits" (California, Oregon Inventors)

ALEXANDRIA, Va., July 28 -- United States Patent no. 12,693,591, issued on July 28, was assigned to Intel Corp. (Santa Clara, Calif.).

"Enhanced mask pattern-aware heuristics for optical proximity corrections for integrated circuits" was invented by Timothy C. Johnston (Sacramento, Calif.), Seongtae Jeong (Portland, Ore.), Talha Khan (Hillsboro, Ore.) and Anjan Raghunathan (Portland, Ore.).

According to the abstract* released by the U.S. Patent & Trademark Office: "This disclosure describes systems, methods, and devices related to optical proximity corrections to an integrated circuit photomask. A method may include identifying a first contour of a first adjacent polygon of a photomask predicted for a first polygon of an integrated circui...