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US Patent Issued to SHANGHAI BRIGHT POWER SEMICONDUCTOR on Sept. 8 for "Metal-oxide semiconductor field-effect transistor having enhanced high-frequency performance and methods for fabricating same" (Chinese Inventors)

ALEXANDRIA, Va., Sept. 8 -- United States Patent no. 12,733,201, issued on Sept. 8, was assigned to SHANGHAI BRIGHT POWER SEMICONDUCTOR Co. LTD. (Shanghai). "Metal-oxide semiconductor field-effect tr... Read More


US Patent Issued to SAMSUNG ELECTRONICS on Sept. 8 for "Transistor" (South Korean Inventors)

ALEXANDRIA, Va., Sept. 8 -- United States Patent no. 12,733,202, issued on Sept. 8, was assigned to SAMSUNG ELECTRONICS Co. LTD. (Suwon-si, South Korea). "Transistor" was invented by Wooyeol Maeng (H... Read More


US Patent Issued to TAIWAN SEMICONDUCTOR MANUFACTURING on Sept. 8 for "Semiconductor device and method for manufacturing the same" (Taiwanese Inventors)

ALEXANDRIA, Va., Sept. 8 -- United States Patent no. 12,733,203, issued on Sept. 8, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan). "Semiconductor device and method... Read More


US Patent Issued to ROHM on Sept. 8 for "Semiconductor device and method of manufacturing the same" (Japanese Inventors)

ALEXANDRIA, Va., Sept. 8 -- United States Patent no. 12,733,204, issued on Sept. 8, was assigned to ROHM Co. LTD. (Kyoto, Japan). "Semiconductor device and method of manufacturing the same" was inven... Read More


US Patent Issued to SEMICONDUCTOR COMPONENTS INDUSTRIES on Sept. 8 for "Vertical shielded gate accumulation field effect transistor" (American, Belgian Inventors)

ALEXANDRIA, Va., Sept. 8 -- United States Patent no. 12,733,206, issued on Sept. 8, was assigned to SEMICONDUCTOR COMPONENTS INDUSTRIES LLC (Scottsdale, Ariz.). "Vertical shielded gate accumulation f... Read More


US Patent Issued to SAMSUNG ELECTRONICS on Sept. 8 for "Semiconductor devices" (South Korean Inventor)

ALEXANDRIA, Va., Sept. 8 -- United States Patent no. 12,733,207, issued on Sept. 8, was assigned to SAMSUNG ELECTRONICS Co. Ltd. (Suwon-si, South Korea). "Semiconductor devices" was invented by Sangh... Read More


US Patent Issued to TAIWAN SEMICONDUCTOR MANUFACTURING on Sept. 8 for "Methods for forming devices with shallow source/drain contacts" (Taiwanese Inventors)

ALEXANDRIA, Va., Sept. 8 -- United States Patent no. 12,733,208, issued on Sept. 8, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan). "Methods for forming devices wit... Read More


US Patent Issued to SAMSUNG ELECTRONICS on Sept. 8 for "Integrated circuit device" (South Korean Inventors)

ALEXANDRIA, Va., Sept. 8 -- United States Patent no. 12,733,209, issued on Sept. 8, was assigned to SAMSUNG ELECTRONICS Co. Ltd. (Suwon-si, South Korea). "Integrated circuit device" was invented by H... Read More


US Patent Issued to TAIWAN SEMICONDUCTOR MANUFACTURING on Sept. 8 for "Semiconductor structure including bottom isolation and method for manufacturing the same" (Taiwanese Inventors)

ALEXANDRIA, Va., Sept. 8 -- United States Patent no. 12,733,210, issued on Sept. 8, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan). "Semiconductor structure includi... Read More


US Patent Issued to Applied Materials on Sept. 8 for "Multilayer inner spacer for gate-all-around device" (California Inventors)

ALEXANDRIA, Va., Sept. 8 -- United States Patent no. 12,733,211, issued on Sept. 8, was assigned to Applied Materials Inc. (Santa Clara, Calif.). "Multilayer inner spacer for gate-all-around device" ... Read More